Preliminary Survey Report: Control Technology for Gallium Arsenide Processing at Raytheon Company, Northborough, Massachusetts, Report No. CT-163-12a

Lenihan, KL; Jones, JH

HERO ID

1357791

Reference Type

Technical Report

Year

1987

HERO ID 1357791
Year 1987
Title Preliminary Survey Report: Control Technology for Gallium Arsenide Processing at Raytheon Company, Northborough, Massachusetts, Report No. CT-163-12a
Authors Lenihan, KL; Jones, JH
Volume NIOSH
Page Numbers 163-12
Abstract A walk through survey evaluated technology available for control of hazardous substances resulting from gallium-arsenide (1303000) (GA) use, especially GA dusts, in semiconductor production at the Raytheon Company, Northborough, Massachusetts. The OSHA standard was 10 micrograms per cubic meter for arsenic. Potential hazards identified included solvent, acid, and gas exposure in production of GA wafers and radio frequency exposure during metallization. In the event of droppage of arsenic-trichloride (7784341), ventilation would shut down, leaving exhaust operational. Leakage in silane (7803625) and hydrogen (1333740) carrying piping would be a fire and explosion hazard. Interlocks were planned for the radio frequency sputterer. Other engineering controls were directed at ventilation, exhaust, and laminar air flow in relevant operations. Safe work practices included aqua-regia (8007565) preparation while most staff were absent, and carrying arsenic-trichloride ampules in plastic containers. Routine air monitoring was not done by the company, but previous personal samples in the epitaxy area did not show detectable levels of arsenic (7440382) or arsine (7784421). A full time nurse was available on site, and safety glasses and polyvinyl-chloride gloves were used where relevant. Recommendations include a regular program of air and wipe sampling and protection of piping. The authors conclude that an in depth survey will probably not be necessary.
Report Number NIOSH/00167892
Is Certified Translation No
Dupe Override No
Comments Journal: Division of Physical Sciences and Engineering ISSN:
Is Public Yes
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