Early stage of growth of a perylene diimide derivative thin film growth on various si(001) substrates
Petit, M; Hayakawa, R; Wakayama, Y; Chikyow, T
| HERO ID | 3575867 |
|---|---|
| In Press | No |
| Year | 2007 |
| Title | Early stage of growth of a perylene diimide derivative thin film growth on various si(001) substrates |
| Authors | Petit, M; Hayakawa, R; Wakayama, Y; Chikyow, T |
| Journal | Journal of Physical Chemistry C |
| Volume | 111 |
| Issue | 34 |
| Page Numbers | 12747-12751 |
| Abstract | This study deals with the growth mode of N,N '-dipenthyl-3,4,9,10-perylenetetracarboxylic diimide (PTCDI-5C) thin films from less than 1 monolayer to 23 monolayers thick. The effects of growth temperature and the thickness and nature of the substratesSiO(2) on Si(001) or octadecyltrichlorosilane (OTS) self-assembled monolayer terminated Si(001) surfacesare discussed. Thin films were deposited from a homemade Knudsen cell by using a hot-wall deposition technique. Films were analyzed by atomic force microscopy, X-ray diffraction, and X-ray reflectivity. Films exhibited a (001) orientation with a 1.63 nm d spacing, and a metastable thin film phase was observed without any distinction of the nature of the substrate. However, differences were noticed in the early stages of growth: PTCDI-5C/SiO2 first monolayers presented a Stransky-Krastanov growth mode, whereas PTCDI-5C/OTS first monolayers showed a more complex mode with incomplete wetting of the substrate surface. Differences between the two morphologies softened as the film thickness increased. |
| Doi | 10.1021/jp071876w |
| Wosid | WOS:000248929100039 |
| Is Certified Translation | No |
| Dupe Override | No |
| Is Public | Yes |