Thermal stability of devices with molybdenum oxide doped organic semiconductors

Lee, J; Kim, M

HERO ID

3576446

Reference Type

Journal Article

Year

2016

HERO ID 3576446
In Press No
Year 2016
Title Thermal stability of devices with molybdenum oxide doped organic semiconductors
Authors Lee, J; Kim, M
Journal Organic Electronics
Volume 28
Page Numbers 172-177
Abstract We demonstrate the thermal stability of transition-metal-oxide (molybdenum oxide; MoO3)-doped organic semiconductors. Impedance spectroscopy analysis indicated that thermal deformation of the intrinsic 1,4-bis[N-(1-naphthyl)-N'-phenylamino]-4,4'-diamine (NPB) layer is facilitated when the MoO(3-)doped NPB layer is deposited on the intrinsic NPB layer. The resistance of the intrinsic NPB layer is reduced from 300 k Omega to 3 k Omega after thermal annealing at 100 degrees C for 30 min. Temperature-dependent conductance/angular frequency frequency (G/w-f-T) analysis revealed that the doping efficiency of MoO3, which is represented by the activation energy (E-a), is reduced after the annealing process. (C) 2015 Elsevier B.V. All rights reserved.
Doi 10.1016/j.orgel.2015.10.034
Wosid WOS:000367775300025
Is Certified Translation No
Dupe Override No
Is Public Yes
Keyword Impedance spectroscopy; Molybdenum oxide; Thermal annealing; Organic semiconductor