Formation of antireflective nanostructures on melamine and N,N '-di(1-naphthyl)-N,N ' diphenyl benzidine (NPB)

Schulz, U; Praefke, C; Munzert, P; Goedeker, C; Kaiser, N

HERO ID

3576593

Reference Type

Journal Article

Year

2011

HERO ID 3576593
In Press No
Year 2011
Title Formation of antireflective nanostructures on melamine and N,N '-di(1-naphthyl)-N,N ' diphenyl benzidine (NPB)
Authors Schulz, U; Praefke, C; Munzert, P; Goedeker, C; Kaiser, N
Volume 1
Issue 1
Page Numbers 101-107
Abstract Plasma-etched nanostructures are useful to provide antireflective properties to glass and plastic substrates. Organic compounds were deposited on glass substrates by thermal evaporation and etched by plasma emitted from an ion plasma source. A self-organized formation of surface structures takes place during etching of a layer of 1,3,5-Triazine-2,4,6triamine (melamine). On the other hand, the surface of N, N' -di(1-naphthyl)N, N' -diphenyl benzidine (NPB) remained smooth after etching. In this case, the structure formation was initiated by depositing a thin oxide layer on to the organic layer prior to the etching step. For both materials the etching process can be tailored to achieve antireflective properties over a desired wavelength range. (C) 2011 Optical Society of America
Wosid WOS:000299046500012
Is Certified Translation No
Dupe Override No
Comments Journal:OPTICAL MATERIALS EXPRESS 2159-3930
Is Public Yes