Useful protocol for evaluating subtle and important differences between photoresist formulations
Pawloski, AR; Nealey, PF
| HERO ID | 5410508 |
|---|---|
| In Press | No |
| Year | 2004 |
| Title | Useful protocol for evaluating subtle and important differences between photoresist formulations |
| Authors | Pawloski, AR; Nealey, PF |
| Journal | Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures |
| Volume | 22 |
| Issue | 3 |
| Page Numbers | 869-874 |
| Doi | 10.1116/1.1695337 |
| Wosid | WOS:000222481400002 |
| Is Certified Translation | No |
| Dupe Override | No |
| Is Public | Yes |