Nitric acid photolysis on surfaces in low-NOx environments: significant atmospheric implications

Zhou, X; Gao, H; He, Y; Huang, G

HERO ID

89439

Reference Type

Journal Article

Year

2003

HERO ID 89439
In Press No
Year 2003
Title Nitric acid photolysis on surfaces in low-NOx environments: significant atmospheric implications
Authors Zhou, X; Gao, H; He, Y; Huang, G
Journal Geophysical Research Letters
Volume 30
Issue 23
Page Numbers 12-1 - 12-4
Abstract Nitric acid (HNO3) is the dominant end product of NOx (= NO + NO2) oxidation in the troposphere, and its dry deposition is considered to be a major removal pathway for the atmospheric reactive nitrogen. Here we present both field and laboratory results to demonstrate that HNO3 deposited on ground and vegetation surfaces may undergo effective photolysis to form HONO and NOx, 1-2 orders of magnitude faster than in the gas phase and aqueous phase. With this enhanced rate, HNO3 photolysis on surfaces may significantly impact the chemistry of the overlying atmospheric boundary layer in remote low-NOx regions via the emission of HONO as a radical precursor and the recycling of HNO3 deposited on ground surfaces back to NOx.
Doi 10.1029/2003GL018620
Wosid WOS:000187489600003
Url http://www.agu.org/pubs/crossref/2003/2003GL018620.shtml
Is Certified Translation No
Dupe Override No
Comments ECRIB. x in NOx is a subscript.Geophys. Res. Lett. 30: 10.1029/2003GL018620.
Is Public Yes
Is Qa No
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